Job Description

Job Title: Mask Designer

Location: Hillsboro, OR

Job Summary:

We are seeking a detail-oriented and experienced Mask Designer to join our semiconductor design team. In this role, you will be responsible for creating precise photomask layouts used in integrated circuit (IC) manufacturing. The ideal candidate will have a strong grasp of layout design rules, photolithography constraints, and experience using industry-standard CAD tools.

Key Responsibilities:

• Design and edit photomask layouts from circuit schematics using CAD tools such as Cadence Virtuoso or Mentor Graphics.
• Perform DRC and LVS checks to ensure design accuracy and manufacturability.
• Collaborate cross-functionally with circuit designers, process engineers, and verification teams to ensure layout integrity.
• Execute tape-out procedures and interface with photomask vendors for mask generation.
• Maintain thorough design documentation, support layout revisions, and implement ECOs.
• Proactively identify and resolve layout issues that could impact yield or performance.

Required Qualifications:

• Associate’s or Bachelor’s degree in Electrical Engineering, Microelectronics, or a related field.
• 2+ years of experience in IC layout or photomask design.
• Proficiency in GDSII/OASIS formats and layout tools (Cadence, Synopsys, Mentor Graphics).
• Solid understanding of semiconductor fabrication and photolithography processes.
• Familiarity with CMOS technology nodes and related design challenges.
• Strong problem-solving skills and attention to detail.

Preferred Qualifications:

• Experience with scripting for automation (e.g., Python, TCL).
• Familiarity with advanced packaging, multi-project wafers, or FinFET layout techniques.
• Knowledge of tape-out flow and interactions with fab teams.

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